The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Sep. 01, 2000
Applicant:
Inventors:
Lynette K. Ballast, Austin, TX (US);
Mark R. Breen, Austin, TX (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/44 ; G01N 2/100 ;
U.S. Cl.
CPC ...
G01J 3/44 ; G01N 2/100 ;
Abstract
Various methods of inspecting a workpiece for residue are provided. In one aspect, a method of inspecting a workpiece for carbon residue includes directing coherent radiation at the workpiece to produce Rayleigh scattered radiation and Raman scattered radiation. The Rayleigh scattered radiation is filtered out. A spectrum for the Raman scattered radiation is detected and compared with a known Raman spectrum for carbon. Wafers may be inspected for residues, such as graphitic carbon, in a non-destructive way and without pump down. Deficiencies in resist stripping may be quickly identified.