The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2002

Filed:

Feb. 11, 1999
Applicant:
Inventor:

Shigeyuki Uzawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/742 ;
Abstract

An exposure apparatus includes a light source for emitting light, an illumination system for illuminating a pattern of a first object with light from the light source, a projection system for projecting the pattern, as illuminated, onto a second object, wherein the same region on the second object to be exposed is exposed plural times through cooperation of the projection system and the illumination system and a changing device for performing the plural times exposures while changing an exposure condition.


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