The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Oct. 02, 2000
Allison Holbrook, San Jose, CA (US);
Greg A. Johnson, Sunnyvale, CA (US);
Darlene Smith, San Jose, CA (US);
Omar Serna, San Jose, CA (US);
Theodros W. Mariam, Santa Clara, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
Aspects for more reliable particle removal from a semiconductor processing chamber following a chamber wet clean are described. With the present invention, an improved particle removal following wet cleans of semiconductor processing chambers occurs. The present invention creates a turbulent gas flow in a chamber in order to more thoroughly remove particles from the chamber, including those that the wet clean procedures cannot reach. In a straightforward and efficient manner, the turbulent gas flow is created by providing gas in both an upper and lower portion of the chamber substantially simultaneously, including the advantageous use of the backside helium available to chamber processing.