The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2002

Filed:

Jun. 29, 2000
Applicant:
Inventors:

John Walter Golz, Cold Spring, NY (US);

Fumihiko Satoh, Shiga, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract

A MOSFET device and method, the method involves forming the MOSFET device by selectively doping bordering channel regions in the device such that, in operation, the threshold, or turn-on, voltage is equalized across the channel. The device structure comprises a self-aligned channel edge implant region for equalizing threshold voltages in the channel edge region with threshold voltages in the channel interior region, thereby virtually eliminating sub-threshold leakage current in low voltage applications.


Find Patent Forward Citations

Golz, John. (2002). Mosfet with self-aligned channel edge implant and method (U.S. Patent No. 6472274). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6472274

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…