The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Aug. 08, 2000
Applicant:
Inventors:
Ashutosh Misra, Plano, TX (US);
Joe G. Hoffman, Dallas, TX (US);
Anthony J. Schleisman, Plano, TX (US);
Assignee:
Air Liquide America Corporation, Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ; B24B 1/00 ;
U.S. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ; B24B 1/00 ;
Abstract
Provided are methods for making a slurry composition, suitable for use in a chemical-mechanical planarization process. Also provided are compositions made by such methods. The methods comprise combining: (a) abrasive particles; (b) a suspension medium; (c) a peroxygen compound; (d) an etching agent; and (e) an alkyl ammonium hydroxide. The methods and compositions of the present invention are particularly applicable to the semiconductor manufacturing industry.