The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Nov. 07, 2001
Applicant:
Inventors:
Gerrit ten Bolscher, Rijssen, NL;
Frank Huussen, Bilthoven, NL;
Assignee:
ASM International N.V., , NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/100 ;
Abstract
A method is provided for pre-treating reactor parts, comprising quartz or silicon, in use in chemical vapor deposition reactors. Applying the pre-treatment prior to deposition increases the cumulative deposited film thickness that can be received by the reactor parts before contamination of wafers processed in said reactors exceeds acceptable limits. The pre-treatment comprises nitridation of the surface of the reactor part, such as by heating the reactor part to a temperature of at least 800° C. and exposing the reactor part to a nitrogen-containing gas.