The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2002

Filed:

Jun. 22, 2000
Applicant:
Inventors:

Masahiro Hatakeyama, Fujisawa, JP;

Katsunori Ichiki, Fujisawa, JP;

Kenji Watanabe, Fujisawa, JP;

Kazuo Yamauchi, Yokohama, JP;

Shinta Kunitomo, Fujisawa, JP;

Tohru Satake, Chigasaki, JP;

Yasushi Tohma, Osaka, JP;

Juichi Ishiguro, Yokohama, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 ; B05D 3/00 ; B44C 1/22 ;
U.S. Cl.
CPC ...
B05D 5/00 ; B05D 3/00 ; B44C 1/22 ;
Abstract

It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk, having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam surface at an inclined angle to the substrate surface. The surface is irradiated through a shielding mask having a specific pattern, so as to produce a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.


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