The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Jun. 11, 1999
Yasuhiro Omura, Tokyo, JP;
Toshihiko Ozawa, Yokohama, JP;
Takashi Mori, Fujisawa, JP;
Hideki Komatsuda, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A projection exposure apparatus ( ) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ , AX, AZ ), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system ( ) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors ( ), a plurality of refractive members ( ), and one or more plane mirrors ( ). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.