The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Feb. 24, 2000
Applicant:
Inventors:
Li-Ming Wang, Taoyuan, TW;
Kao-Tsair Tsai, Kaohsiung, TW;
Assignee:
Winbond Electronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/725 ; G03C 1/73 ; G03C 1/735 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03C 1/725 ; G03C 1/73 ; G03C 1/735 ; G03C 5/00 ;
Abstract
A method for the mitigation of the generation of side-lobes in a photolithography process is described. The method includes the steps of forming a photoresist layer on a semiconductor substrate. An exposure process is conducted on the photoresist layer with a phase-shifting mask, transferring the pattern of the mask on the photoresist layer. After this, a post-exposure baking process is conducted on the photoresist layer after it has been exposed, followed by performing a development process to complete the patterning of the photoresist layer.