The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
May. 03, 2000
Semyon Sherstinsky, San Francisco, CA (US);
Calvin Augason, Los Altos, CA (US);
Leonel A. Zuniga, San Jose, CA (US);
Jun Zhao, Cupertino, CA (US);
Talex Sajoto, Campbell, CA (US);
Leonid Selyutin, San Leandro, CA (US);
Joseph Yudovsky, Campbell, CA (US);
Maitreyee Mahajani, San Jose, CA (US);
Steve G. Ghanayem, Sunnyvale, CA (US);
Tai T. Ngo, Dublin, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A support member for supporting a substrate in a process chamber, the support member having a substrate support surface with one or more isolated recessed areas. A vacuum channel and a gas channel are formed in the support member along a common plane and are coupled to a vacuum source and gas source respectively. The gas channel comprises two or more concentrically disposed annular gas channels encompassing the vacuum channel. The vacuum channel is coupled to the support surface, and in particular to the one or more recessed areas, by a plurality of conduits. A portion of the conduits is disposed diametrically exterior to at least one of the annular gas channels and communicates with the vacuum channel via bypass channels.