The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2002
Filed:
Oct. 21, 1999
Applicant:
Inventors:
Shinichi Fukuzawa, Tokyo, JP;
Shigeyoshi Ootsuki, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 2/980 ;
U.S. Cl.
CPC ...
H01J 2/980 ;
Fukuzawa, Shinichi. (2002). Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask (U.S. Patent No. 6459193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6459193
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile