The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6458431 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 01, 2002

Filed:

Jul. 30, 2001
Applicant:
Inventors:

Ross H. Hill, Coquitlam, CA;

Juan Pablo Bravo-Vasquez, Burnaby, CA;

Assignee:

EKC Technology, Inc., Hayward, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 ;
U.S. Cl.
CPC ...
H05H 1/00 ;
Abstract

A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.


Find Patent Forward Citations

Hill, Ross. (2002). Methods for the lithographic deposition of materials containing nanoparticles (U.S. Patent No. 6458431). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6458431

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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