The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2002

Filed:

Sep. 10, 1998
Applicant:
Inventors:

Jyoti Kiron Bhardwaj, Bristol, GB;

Leslie Michael Lea, Didcot, GB;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ;
Abstract

A plurality of antennae generate a plasma in the chamber containing a workpiece, and the relative outputs of the antennae are varied as a detector detects a property or parameter of the resultant plasma or process. The relative outputs of the antennae are controlled in accordance with the property or parameter detected. The detector, which detects the property or parameter at or near the workpiece location, is a Langmuir probe which is shielded from the plasma by a semiconductor or insulating layer and is driven.


Find Patent Forward Citations

Bhardwaj, Jyoti. (2002). Plasma processing apparatus (U.S. Patent No. 6458239). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6458239

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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