The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2002

Filed:

Aug. 22, 2000
Applicant:
Inventors:

Takeyoshi Taguchi, Tachikawa, JP;

Noboru Osawa, Hachioji, JP;

Kazuyuki Tohji, Sendai, JP;

Assignee:

Rigaku Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/06 ;
U.S. Cl.
CPC ...
G21K 1/06 ;
Abstract

An X-ray spectrometer having a curved crystal monochromator which diffracts a continuous X-ray beam from an X-ray source to produce a monochromatic X-ray beam. An angle of incidence of the continuous X-ray beam can be changed with respect to the monochromator so as to change the wavelength of the monochromatic X-ray beam which is focused on and taken out from a receiving slit. The X-ray source, the monochromator and the receiving slit must be positioned always on a Rowland circle. The X-ray source and the monochromator can be moved so that the angle of incidence changes, while the receiving slit remains always stationary and the direction of an X-ray path from the center of the monochromator to the receiving slit remains always constant. Such an X-ray spectrometer is usable as an X-ray irradiation system of XAFS (X-ray Absorption Fine Structure) apparatus so that XAFS measurements require no movement of the sample.


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