The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2002

Filed:

Jun. 01, 2001
Applicant:
Inventors:

Chun Jiang, San Jose, CA (US);

Robert Tu, Sunnyvale, CA (US);

Sunil D. Mehta, San Jose, CA (US);

Assignee:

Lattice Semiconductor Corporation, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18247 ;
U.S. Cl.
CPC ...
H01L 2/18247 ;
Abstract

An improved method for fabricating a tunnel oxide window for use in an EEPROM memory cell is provided so as to produce better programming endurance. A P+ implant is provided at the tunnel window edge. During the programming operation, the P+ contacted inversion layer is used instead of the program junction. As a result, there is eliminated the voltage drop in the program junction region so as to improve the efficiency of programming.


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