The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
Dec. 28, 1999
Applicant:
Inventors:
Hong Qiu, Beijing, CN;
Kouji Sumi, Nagano, JP;
Masato Shimada, Nagano, JP;
Tsutomu Nishiwaki, Nagano, JP;
Kazumasa Hasegawa, Nagano, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/02 ; B05D 3/10 ; B05D 3/00 ;
U.S. Cl.
CPC ...
B05D 3/02 ; B05D 3/10 ; B05D 3/00 ;
Abstract
A process for the formation of an oxide ceramic thin film, which permits the control of film oxygen content and can give a film reduced in oxygen deficiency. The process is characterized in that the step of forming an amorphous thin film, the step of heating the thin film to crystallize it or the step of heat-treating the crystallized film is conducted in a moisture-containing atmosphere.