The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Jul. 09, 1999
Ball Semiconductor, Inc., Allen, TX (US);
Abstract
The present invention provides a method for segmenting and mapping a two-dimensional conventional circuit pattern to a flat mask for projection onto a three-dimensional surface. The circuit pattern is first segmented into a plurality of circuit segments enclosed in a plurality of base units of an imposed grid system. Subsequently, locations and the boundary conditions for a plurality of mask segments on the mask are determined such that no unneeded overlapping at the boundaries of the projected image on the spherical shaped semiconductor device is possible. The mask, along with a photolithography system having a plurality of mirrors, projects the circuit pattern onto the spherical shaped semiconductor device.