The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Nov. 24, 1999
Applicant:
Inventor:
Daisuke Iitsuka, Osaka, JP;
Assignee:
Read-Rite Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 ; G11B 5/31 ; B44C 1/22 ;
U.S. Cl.
CPC ...
G03C 5/00 ; G11B 5/31 ; B44C 1/22 ;
Abstract
An apparatus and method for formation of the upper magnetic pole layer of a thin film magnetic head. The presently described method for formation of the upper magnetic pole layer of a thin film magnetic head enables the formation with submicron precision of a resist layer for use in forming the upper magnetic pole layer, which must necessarily be formed on a surface having a step, which can contribute to further improvement of areal recording densities. A frame for use in forming the upper magnetic pole layer is formed from multiple resist layers, and the relatively thick lower resist layer is formed by a vacuum thin film formation method.