The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Jun. 15, 2001
Applicant:
Inventor:
Roland Brunner, Reut, DE;
Assignee:
Wacker Siltronic Gesellschaft fur Halbleiterma Terialien AG, Burghausen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 ;
U.S. Cl.
CPC ...
C23G 1/02 ;
Abstract
A process for the chemical treatment of semiconductor wafers in the presence of HF and then in the presence of ozone, in particular for the cleaning of silicon semiconductor wafers, is such that the semiconductor wafers that are treated with the medium containing ozone are free of aqueous HF.
Brunner, Roland. (2002). Process for the chemical treatment of semiconductor wafers (U.S. Patent No. 6451124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6451124
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile