The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
Jun. 01, 2000
Minoru Doi, Kanagawa, JP;
Semiconductor Leading Edge Technologies, Inc., Kanagawa, JP;
Abstract
There are provided an system for evaluating the amount of particles, a dip cleaning system, and a method of evaluating the amount of particles adhering to a substrate, which enable high-precision quantitative evaluation of the amount of particles suspended in a liquid without use of a monitor substrate, which enable easy determination of the correlation between the amount of particles suspended in the liquid and the amount of particles adhering to the substrate which is an object of cleaning, and which enable low-cost and highly-reliable cleaning evaluation. A residual liquid recovery pan for recovering a residual liquid interposed and a residual liquid quantitative measurement bath for measuring the amount of submerged particles is interposed, between the first substrate treatment bath and the second substrate treatment bath. A sample liquid is prepared by recovering a residual liquid dropped from the substrate by the residual liquid recovery pan and the residual liquid quantitative measurement bath when the substrate is transported from the first substrate treatment bath to the second substrate treatment bath through use of the substrate transportation structure. The sample liquid stored in the pure water metering bath is diluted with a predetermined amount of pure water by means of supplying pure water from the pure water supply source to the pure water metering bath. The amount of particles suspended in the thus-diluted sample liquid is measured through use of the submerged particle counter.