The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2002

Filed:

Jan. 30, 2001
Applicant:
Inventors:

Yider Wu, San Jose, CA (US);

Jean Y. Yang, Sunnyvale, CA (US);

Hidehiko Shiraiwa, San Jose, CA (US);

Che-Hoo Ng, San Martin, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/972 ;
U.S. Cl.
CPC ...
H01L 2/972 ;
Abstract

One aspect of the present invention relates to a non-volatile semiconductor memory device, containing a silicon substrate; a tunnel oxide layer over the silicon substrate, the tunnel oxide layer comprising fluorine atoms; a charge trapping layer over the tunnel oxide layer; an electrode or poly layer over the charge trapping layer; and source and drain regions within the silicon substrate. Another aspect of the present invention relates to a method of making a non-volatile semiconductor memory cell having improved erase speed, involving the steps of providing a silicon substrate; forming a tunnel oxide layer comprising fluorine atoms over the silicon substrate; and forming non-volatile memory cells over the tunnel oxide layer.


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