The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2002

Filed:

Jun. 20, 2000
Applicant:
Inventors:

Edwin G. Haas, Sayville, NY (US);

Robert M. Gutowski, Glen Oaks, NY (US);

Vincent S. Calia, Greenlawn, NY (US);

Assignee:

Advanced Energy Systems, Inc., Bethpage, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/34 ;
U.S. Cl.
CPC ...
H05H 1/34 ;
Abstract

An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle ( ) may include a nozzle cavity ( ) disposed within a nozzle body ( ) between an up-stream end ( ) and a down-stream end ( ). A nozzle passage ( ) may be defined within the nozzle cavity ( ) and extend a longitudinal length ( ) from the down-stream end ( ) of the nozzle body ( ) into the nozzle cavity ( ). A discharge orifice ( ) may also be defined at the down-stream end ( ) of the nozzle cavity ( ) and have an associated width ( ). The width ( ) of the discharge orifice ( ) may be substantially less than the longitudinal length ( ) of the nozzle passage ( ).


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