The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Mar. 23, 2000
Applicant:
Inventors:
Angela T. Hui, Fremont, CA (US);
Jusuke Ogura, Cupertino, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method for forming high quality oxide layers having different thicknesses by eliminating descum induced defects. The method includes forming an oxide layer, masking the oxide layer with a photoresist layer, developing the photoresist layer to expose a region of the oxide layer. The substrate is then descummed to remove any residue resulting from the development of the photoresist. Following the descum process, the substrate is rinsed in water. The oxide layer is then etched, and the remaining photoresist is stripped before another layer of oxide is grown on the substrate.