The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Jun. 19, 2000
Christopher P. Ausschnitt, Brookfield, CT (US);
Christopher E. Obszarny, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A monitor for electrically testing energy beam dose or focus of a layer formed on a substrate by lithographic processing. The monitor comprises a substrate having in a lithographically formed layer an array of electrically conductive elements comprising a plurality of spaced, substantially parallel elements having a length and a width, with the individual elements being electrically connected, and the lengths of the elements being sensitive to dose and focus of an energy beam in lithographically forming the layer. The monitor further includes at least one pad electrically connected to the array to apply current through the array elements. Upon applying a voltage across the array elements, the suitability of dose or focus of the lithographically formed layer may be determined by the resistance of the array. Preferably, ends of the individual elements are aligned along essentially straight lines to form an array edge.