The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Mar. 29, 2000
Scott Brad Herner, Palo Alto, CA (US);
Sandeep A. Desai, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical vapor deposition process for depositing a tungsten film on a substrate disposed in a substrate processing. The method includes depositing nucleation and bulk deposition tungsten layers. The nucleation layer is deposited by flowing a first process gas comprising tungsten hexafluoride, silane, molecular hydrogen and argon into said substrate processing chamber, where the flow ratio of molecular hydrogen to argon is at least 1.5:1 and the partial pressure of tungsten hexafluoride is less than or equal to 0.5 Torr. The bulk deposition layer is then deposited over the nucleation layer by flowing a second process gas comprising tungsten hexafluoride and a reduction agent into the substrate processing chamber.