The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Apr. 14, 2000
Masato Ikegawa, Tsuchiura, JP;
Tsutomu Tetsuka, Niihari, JP;
Ichiro Sasaki, Yokohama, JP;
Tatehito Usui, Niihari, JP;
Hironobu Kawahara, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In the plasma processing device for supplying electromagnetic waves to the first plate, generating plasma in the vacuum atmosphere between the first plate and the second plate which is arranged opposite to it, and processing the board loaded on the second plate, wherein the dielectric window for propagating electromagnetic waves is installed in the outer periphery of the first plate and in the window, the electromagnetic wave distribution corrector composed of an electrical conductor or a dielectric is embedded away from the first plate so that at least the side and bottom of the electromagnetic wave distribution corrector are not exposed in the aforementioned vacuum atmosphere. The electromagnetic wave distribution corrector corrects one-siding of the plasma density distribution at the center.