The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2002

Filed:

Sep. 08, 2000
Applicant:
Inventors:

Dirk Basting, Fort Lauderdale, FL (US);

Sergei V. Govorkov, Boca Raton, FL (US);

Uwe Stamm, Goettingen, DE;

Assignee:

Lambda Physik AG, Goettingen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/098 ;
U.S. Cl.
CPC ...
H01S 3/098 ;
Abstract

A molecular fluorine (F ) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates comprise a material that is substantially transparent at 157 nm, such as CaF , MgF , LiF , BaF , LiF, SrF , quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur®, ultra low expansion glass, and quartz. A beam expander is preferably provided before the etalon for expanding the beam before the beam is incident on the etalon. The beam expander is preferably configured to reduce the divergence of the beam.


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