The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2002

Filed:

Dec. 14, 1999
Applicant:
Inventors:

Li-Qun Xia, Santa Clara, CA (US);

Francimar Campana, Milpitas, CA (US);

Ellie Yieh, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ;
U.S. Cl.
CPC ...
B44C 1/22 ;
Abstract

A method is provided for reducing elevated boron concentrations (denoted as “boron spikes”) in an insulating layer containing silicon, boron and other elements where the layer interfaces with surfaces of a semiconductor device. The method includes the steps of: seasoning a reaction chamber by flowing into it a mixture of gasses containing silicon, boron, ozone and other elements in predetermined proportions under set conditions of time, pressure, temperature and flow rates to deposit on inner walls and surfaces of the chamber a thin seasoning coating, and placing a semiconductor device in the chamber and covering it with an insulating layer having a composition similar to the seasoning coating. Subsequent etching of selected portions of the insulating layer has been found not to expose conductive surfaces of the device.


Find Patent Forward Citations

Xia, Li-Qun. (2002). Method of reducing undesired etching of insulation due to elevated boron concentrations (U.S. Patent No. 6426015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6426015

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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