The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
Jul. 12, 2000
Applicant:
Inventors:
David P. Sheriff, Anaheim Hills, CA (US);
Chiun Wang, Cerritos, CA (US);
Assignee:
Unit Instruments, Inc., Yorba Linda, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 1/510 ; G01F 1/504 ; G01F 2/704 ; G01F 7/00 ; G01F 9/00 ;
U.S. Cl.
CPC ...
G01F 1/510 ; G01F 1/504 ; G01F 2/704 ; G01F 7/00 ; G01F 9/00 ;
Abstract
A pressure insensitive gas process device that includes a gas sensor and restrictions upstream and downstream of the gas sensor. The restrictions result in pressure drops upstream and downstream of the gas sensor which shield the gas sensor from upstream and downstream pressure changes, respectively, rendering the gas sensor and the entire gas process device insensitive to pressure changes. Gas process devices in which pressure insensitivity may be achieved include mass flow controllers as well as other types of devices.