The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2002
Filed:
Sep. 16, 1998
Yasuyuki Miyamoto, Nagareyama, JP;
Hiroo Hongo, Stuttgart, DE;
Tokyo Institute of Technology, Tokyo, JP;
Abstract
An alignment mark for use in electron beam lithography for manufacturing a fine semiconductor structure by repeating a regrowth of a compound semiconductor layer and a fine process including electron beam exposure. The alignment mark includes a lower protection layer made of tungsten formed on a compound semiconductor substrate, a mark main body made of gold, chromium or platinum shaped into a desired pattern having a sharp edge profile which generates a detection signal of a mark position having a large gain, and an upper protection layer covering the mark main body and made of silicon oxide which does not react significantly with substances constituting a compound semiconductor layer. The mark main body has a thickness which is not less than 100 nm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile