The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Jul. 12, 2000
Karl Mautz, Dresden, DE;
Motorola, Inc., Schaumburg, IL (US);
Abstract
The invention relates to a system and a method for manufacturing semiconductor devices on a wafer with the steps of: coating ( ) a photoresist onto said wafer, heating ( ) said wafer to a prebake temperature for outgassing the solvent of the photoresist, exposing ( ) said wafer to deep UV light for chemically modifying said photoresist in predetermined areas, heating ( ) said wafer to a post exposure bake temperature for activating a chemical reaction, developing ( ) said photoresist, stabilizing ( ) said photoresist, meteorology inspection ( ), etching, wet processing or implanting ion, wherein said stabilizing ( ) of said photoresist occurs before the beginning of the etch process and comprises a controlled chemical contamination of said photoresist surface by ammonia/amine chemicals.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile