The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Apr. 24, 1998
Applicant:
Inventors:
Andrew Duncan McQuarrie, San Jose, CA (US);
Lee Campbell Boman, Belmont, CA (US);
Assignee:
Surface Technology Systems, plc, Newport, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/02 ;
U.S. Cl.
CPC ...
C23F 1/02 ;
Abstract
An XeF source includes a XeF source chamber having a tray or ampoule for XeF crystals, a reservoir coupled to the XeF source chamber via a valve, a flow controller fed by the reservoir and a valve between the reservoir and the flow controller. Pressure sources are provided respectively to maintain the reservoir and the source chamber at the sublimation pressure of XeF . The arrangement allows for a steady supply of XeF to an etching chamber.
McQuarrie, Andrew. (2002). Apparatus for etching a workpiece (U.S. Patent No. 6409876). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6409876
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile