The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
May. 12, 1999
Applicant:
Inventor:
Kazuyuki Maruo, Tokyo, JP;
Assignee:
Advantest Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/36 ;
U.S. Cl.
CPC ...
G06K 9/36 ;
Abstract
Image data is edge-processed and then digitized. This image data is Hough-transformed to generate a parameter plane in which multiple Hough-curves are plotted in a parameter space, from which coordinates with multiple intersected Hough-curves are extracted and grouped. For each group, representative coordinates are selected to estimate slopes of linear components in the image data. In this way, the linear components can be recognized from the image data to estimate the slope, thereby making it possible to modify slopes of linear components in image data of a semiconductor wafer taken at an arbitrary angle or the like.