The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Jan. 04, 2001
John Garcia, Morgan Hill, CA (US);
Andrew Yednak, III, Phoenix, AZ (US);
SpeedFam-IPEC Corporation, Chandler, AZ (US);
Abstract
A rotary union is provided for chemical mechanical polishing of silicon wafers, especially silicon wafers containing chemically sensitive integrated circuit structures. A rotary union is provided with a union rotor and union stator, coupled at the free end of a support spindle carrying a CMP polishing table. In the preferred embodiment the rotary union is joined to a coolant union forming the lower end of the support spindle. A passageway through the union rotor extends past the bottom end of the coolant union rotating part to avoid contact of fluid transmitted through the passageway formed in the union rotor, with the rotating part of the coolant union.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile