The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2002

Filed:

May. 04, 2000
Applicant:
Inventors:

Jonathan D. Mohn, Saratoga, CA (US);

Arthur H. Sato, San Jose, CA (US);

Kien Nai Chuc, Cupertino, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ; H01L 2/100 ;
Abstract

The present invention is embodied in a plasma reactor with an inductive coil antenna facing the reactor chamber in which the windings of the coil antenna have a flattened cross-sectional shape, the flat portion of the winding facing toward the plasma within the reactor. Preferably, the coil antenna is located outside the reactor and faces a ceiling or wall of the reactor chamber. The coil antenna may be a single helical coil winding or multiple concentric spiral windings.


Find Patent Forward Citations

Mohn, Jonathan. (2002). Plasma reactor inductive coil antenna with flat surface facing the plasma (U.S. Patent No. 6401652). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6401652

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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