The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2002

Filed:

Nov. 15, 2000
Applicant:
Inventors:

Cho-Ching Chen, Tainan, TW;

Shin-Shing Yang, Tainan, TW;

Jenn-Wei Ju, Taichung, TW;

Liang-Yi Chou, Tainan, TW;

Chih-Hong Cheng, Kao Hsiung County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F26B 1/310 ; F26B 2/114 ;
U.S. Cl.
CPC ...
F26B 1/310 ; F26B 2/114 ;
Abstract

An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking system is activated to stop the further loading of wafers into the drying chamber and thus preventing the outputting of undried wafers from the chamber. The apparatus is used to prevent any malfunction in the flow control valves or in any other flow control system that stops the flow of solvent vapor into the drying chamber.


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