The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Oct. 26, 1999
Applicant:
Inventors:
Mindi Xu, Naperville, IL (US);
Richard Udischas, Joliet, IL (US);
Carol Schnepper, Tulsa, OK (US);
Joseph Paganessi, Burr Ridge, IL (US);
Assignee:
American Air Liquide, INC, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 1/16 ; B01D 1/900 ;
U.S. Cl.
CPC ...
B01D 1/16 ; B01D 1/900 ;
Abstract
Provided is a novel system for vaporizing and purifying a gas to produce ultrapure chemical gases employed at a semiconductor processing facility. The system includes a liquified gas source, a vaporization purification bed, and a buffer tank. The liquefied gas source is in communication with the vaporization purification bed to provide a liquefied gas to the bed with an ultra-pure chemical gas generated in the purification bed. The purified gas is subsequently routed to a buffer tank and to a point of use therefrom.