The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2002

Filed:

Oct. 10, 2000
Applicant:
Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/754 ; G01N 1/10 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/754 ; G01N 1/10 ;
Abstract

A lithographic projection apparatus is disclosed. The lithographic projection apparatus includes an illumination system to supply a projection beam of radiation, a first object table to hold a mask, a second object table provided with a support surface to support and hold a substrate at its backside surface and a projection system to image an irradiated portion of the mask onto a target portion of the substrate including a detector constructed and arranged to detect the presence of contamination on one or both of the support surface and the substrate backside surface.


Find Patent Forward Citations

van de Pasch, Engelbertus A. F.. (2002). Lithographic projection apparatus (U.S. Patent No. 6392738). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6392738

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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