The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Jun. 11, 1998
Michael N. Grimbergen, Redwood City, CA (US);
Xue-Yu Qian, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process chamber for processing a substrate and monitoring the process conducted on the substrate , comprises a support , a gas distributor, and an exhaust . The process chamber has a wall comprising a window that allows light to be transmitted therethrough and reduces deposition of process residue from the process gas onto the window during processing of the substrate . In one version, the window comprises a transparent plate covered by an overlying mask that has at least one aperture extending through the mask so that light can be transmitted through the aperture and the transparent plate
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile