The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2002

Filed:

May. 31, 2001
Applicant:
Inventors:

Randall Cha, Singapore, SG;

Tae Jong Lee, Orlando, FL (US);

Alex See, Singapore, SG;

Lap Chan, San Francisco, CA (US);

Chua Chee Tee, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18244 ;
U.S. Cl.
CPC ...
H01L 2/18244 ;
Abstract

A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.


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