The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2002
Filed:
Jan. 14, 2000
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A method of removing the micro-scratches on a metal layer is described, wherein the metal layer is formed on a barrier layer conformally onto a dielectric layer having a hole thereon, and wherein the metal layer over-fills the hole. The method comprises three chemical-mechanical polishing steps as described hereinbelow. The first chemical-mechanical polishing step is that oxidizing and polishing away the metal layer outside the hole, with a first slurry, wherein the first slurry has a chemical solution and has a plurality of abrasive particles. The second chemical-mechanical polishing step is that polishing away the barrier layer outside the hole, with a second slurry, whereby a plurality of micro-scratches are formed on the metal layer after the barrier layer is chemical-mechanically polished. The third chemical-mechanical polishing step is that buffing the metal layer, with the first slurry, thereby removing the micro-scratches on the metal layer.