The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2002

Filed:

Jan. 04, 1999
Applicant:
Inventors:

Toshiharu Furukawa, Essex Junction, VT (US);

Jeffrey P. Gambino, Gaylordsville, CT (US);

Edward W. Kiewra, Verbank, NY (US);

Jack A. Mandelman, Stormville, NY (US);

Carl J. Radens, LaGrangeville, NY (US);

William R. Tonti, Essex Junction, VT (US);

Mary E. Weybright, Pleasant Valley, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1242 ;
U.S. Cl.
CPC ...
H01L 2/1242 ;
Abstract

A structure and method for simultaneously forming array structures and support structures on a substrate comprises forming the array structures to have a V-groove, forming the support structures to have a planar surface, and simultaneously forming a first oxide in the V-groove and a second oxide in the planar surface, wherein the first oxide is thicker than the second oxide.


Find Patent Forward Citations

Furukawa, Toshiharu. (2002). Dual tox trench dram structures and process using v-groove (U.S. Patent No. 6380027). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6380027

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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