The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2002

Filed:

Mar. 29, 2000
Applicant:
Inventor:

Richard A. Chapman, Dallas, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18238 ;
U.S. Cl.
CPC ...
H01L 2/18238 ;
Abstract

A method of fabricating a CMOS transistor to construct shallow drain extenders ( ) using a replacement gate design. The method involves forming epitaxial layers ( ) and ( ) the will later function as shallow drain extensions. The etching of the replacement gate ( ) and the formation of inner sidewalls ( ) serve to define the transistor gate length.


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