The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Apr. 07, 2000
Applicant:
Inventor:
Andreas Englisch, Hamburg, DE;
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/166 ; G03F 9/00 ;
U.S. Cl.
CPC ...
H01L 2/166 ; G03F 9/00 ;
Abstract
A method and apparatus for monitoring and evaluating effects of electrostatic discharge associated with semiconductor manufacturing are disclosed. The method may include, for example, exposing a test photomask that contains an ESD sensitive geometry to a single or a variety of semiconductor manufacturing procedures. The test photomask may be analyzed to determine how much, if any, degradation of its geometry has occurred as a result of the exposure.