The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Apr. 03, 2000
Applicant:
Inventors:
Assignee:
Chartered Semiconductor Manufacturing Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; C23F 1/00 ; H01L 2/100 ;
U.S. Cl.
CPC ...
B44C 1/22 ; C23F 1/00 ; H01L 2/100 ;
Abstract
A new method is provided for the creation of a fuse. A layer of metal is first deposited, the layer of metal is patterned and etched creating a metal strip that is interrupted by a gap. The fusing function is created in the gap, the interrupted metal strip serves as the connectors to the fuse. A layer of conducting conjugated polymer is deposited over the metal strip and the therein created gap, the polymer is etched back leaving the deposited polymer in the gap between the two metal strips.
Ng, Chit. (2002). Method to form fuse using polymeric films (U.S. Patent No. 6375857). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6375857
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile