The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2002

Filed:

Dec. 28, 1998
Applicant:
Inventors:

Toshio Kato, Tokyo, JP;

Noboru Tokumasu, Tokyo, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract

A method of cleaning a substrate is provided which can remove contamination after treatment of a substrate surface by use of chemicals etc. prior to film formation. The method of cleaning the substrate surface uses of a vapor of chlorosulfonic acid (SO Cl(OH)).


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