The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Jun. 29, 2000
Applicant:
Inventor:
Hideki Gomi, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
Polymer of parylene is desirable for an inter-level insulating layer because of a small dielectric constant; however, dimer/monomer of parylene is taken into a polymer layer during the deposition, residual dimer/monomer produces outgas during deposition of silicon oxide over the polymer layer, and the silicon oxide layer tends to peel off from the polymer layer; in order to prevent the resultant semiconductor structure layer from peeling of the silicon oxide layer, the polymer layer is annealed before the deposition of the silicon oxide for previously releasing the residual dimer/monomer from the polymer layer.