The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Apr. 23, 1999
Applicant:
Inventors:
Alexander I. Gurary, Bridgewater, NJ (US);
Paul Thomas Fabiano, Lebanon, NJ (US);
David Russell Voorhees, Hopewell, NJ (US);
Scott Beherrell, Phillipsburg, NJ (US);
Assignee:
Emcore Corporation, Somerset, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
C30B 2/512 ;
U.S. Cl.
CPC ...
C30B 2/512 ;
Abstract
A chemical vapor deposition reactor includes a pancake type induction heating device to achieve operating temperature within the reactor chamber. By design of the susceptor, the induction magnetic force created at the top surface of the susceptor is insufficient to effect levitation of the wafer carrier during epitaxial deposition at high temperatures in the order of about 1500-1800° C.