The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Nov. 01, 1999
Kazuyoshi Namba, Hachioji, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A processing apparatus is provided for cleaning a wafer W. In the apparatus, a carbonated solution in the form of mist is ejected onto the wafer W through a nozzle , so that the film of carbonated solution, i.e., a conductive liquid film is formed on the wafer W. Next, a pure water highly pressurized by a jet pump is ejected on the wafer W for cleaning it. The film of carbonated solution prevents devices built on the wafer W from being broken electrostatically. A liquid passage from a supply source of the carbonated solution up to the nozzle is made of material which does not dissolve its metallic components into the carbonated solution in spite of the contact of the liquid passage with the carbonated solution.