The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Jun. 02, 1999
Yoshihiro Koyama, Chiba, JP;
Kazuo Aita, Chiba, JP;
Seiko Instruments Inc., Chiba, JP;
Abstract
In a charged particle beam apparatus comprising an ion optical system for focusing ions, a secondary charged particle detector for detecting secondary charged particles produced by beam irradiation of scanning a focused ion beam focused by the ion optical system to a predetermined region of a sample , a display unit for displaying an image of the sample surface based on a signal of the secondary charged particle detector, and a gas injector for blowing a gas to the sample surface , a focused ion beam processing apparatus is characterized by conducting processing by cooling a gas trap provided between a reservoir or cylinder and a valve to control an assist gas having a high vapor pressure and blowing it through the gas injector simultaneously with irradiating a focused ion beam.